The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 1994
Filed:
Jan. 07, 1993
Applicant:
Inventors:
Tetsuro Kuwayama, Yokohama, JP;
Naosato Taniguchi, Atsugi, JP;
Yoko Yoshinaga, Machida, JP;
Nobuo Kushibiki, Yamato, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; G02B / ;
U.S. Cl.
CPC ...
359-3 ; 359 15 ; 359566 ; 359569 ; 359 13 ;
Abstract
The present invention provides a diffraction device having a high diffraction efficiency with respect to a wide-band radiation beam. A diffraction device comprises a substrate and a diffraction grating formed on the substrate, wherein the diffraction grating is formed so that a full-width of wavelength at half maximum of a diffraction efficiency of a beam diffracted by the diffraction grating is not less than about 8% of a value of a center wavelength of the diffracted beam.