The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 1994
Filed:
Mar. 22, 1993
Asahi Glass Company, Ltd., Tokyo, JP;
Abstract
A method for evaluating internal quality of fused cast refractories including the steps of: emitting electromagnetic wave pulses from sending and receiving antennas moving vertically in the vicinity of a side face of a refractory sample through the side face to an inner portion of the sample electromagnetic waves reflected by the sample via by the sending and receiving antennas, thereby obtaining crude reflected wave images; and evaluating an internal structure of the sample based on the picture of reflected wave images. By the present method, an entire inner structure of a fused cast refractory may be evaluated by emitting electromagnetic wave pulses through only by one side face toward a symmetry plane of said fused cast refractory about which the fused cast refractory is symmetrical, and receiving electromagentic waves reflected from an inner surface of the fused cast refractory sample. Therefore, due to the structural symmetry of a fused cast refractory, an internal quality of an entire inner surface of a fused cast refractory may be evaluated on the basis of crude reflected wave images corresponding to a half portion of the fused cast refractory sample.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile