The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 1994
Filed:
Jun. 11, 1992
Applicant:
Inventors:
Assignee:
Iomega Corporation, Roy, UT (US);
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912184 ; 21912168 ; 21912169 ; 360135 ;
Abstract
The current invention provides an apparatus and method of collecting waste materials produced during laser etching of a floptical medium without blocking access to the medium surface. The invention also improves collection efficiency by applying a uniform low-pressure air around the outer edge of the medium. Because the air pressure is applied around the edge, there is no necessity to coordinate a movement or timing of the current invention with respect to the laser etching unit.