The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 1994

Filed:

Feb. 16, 1993
Applicant:
Inventors:

Robert J Celotta, Darnestown, MD (US);

Jabez J McClelland, Bethesda, MD (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437173 ; 437 80 ; 437 81 ; 437948 ; 250251 ;
Abstract

A method of depositing atoms on a substrate in which a beam of atoms is optically focused utilizing a laser beam. The laser beam is used to form a standing wave above the surface of a substrate. As the beam of atoms is passed through the standing wave, the atoms are focused by dipole force interactions. The deposition of atoms is focused into parallel lines which coincide with the minima of the standing wave. The use of two standing waves allows for focusing the atoms into discrete dots or spots. Relative movement between the substrate and the standing wave(s) allows for depositing atoms in a scanning manner. Various nanostructures can be made by the disclosed method.


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