The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 1994
Filed:
Sep. 21, 1992
Applicant:
Inventor:
Michael J Hanrahan, Hilton, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430324 ; 430-7 ; 430156 ; 430326 ; 430329 ; 430330 ;
Abstract
A lithographic patterning process which produces a lift-off structure uses two separate layers, the bottom being deep ultraviolet patternable and the top being patternable at an appropriate wavelength other than deep ultraviolet and having low optical transmission properties at the wavelength used in a deep ultraviolet exposure step and characterized by decreased solubility and/or increased crosslink density after such deep ultraviolet exposure.