The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 1994

Filed:

Nov. 02, 1992
Applicant:
Inventor:

Bogdan Zaleski, Columbus, OH (US);

Assignee:

Omnitech Electronics, Inc., Columbus, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01N / ;
U.S. Cl.
CPC ...
356387 ; 250560 ;
Abstract

A photometric gauge for measuring the diameters of a workpiece turned about a central axis. The apparatus comprises a light source which scans a light beam across and on either side of a workpiece, to reflect scanned light from a mirror having an approximately elliptical curvature. The light source is located at one focus of the elliptical mirror and a light detector is located at the other focus. Light passing beside the workpiece from the light source focus reflects back to the light detector focus, and the light detector generates an electrical signal. The signal is used by an electronic data processor, along with known geometric parameters, to determine the diameter of the workpiece. A profiler, using the above photometric gauge, takes diameter measurement at regular intervals along the axis of the workpiece, and plots the diameter versus axial position data.


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