The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 1994

Filed:

Mar. 08, 1993
Applicant:
Inventor:

Shunji Inoue, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
156294 ; 114222 ; 156 71 ; 428907 ;
Abstract

The invention provides a method for the lining of an organism deposit-inhibition structure, which enables that structure to be easily lined to an application surface, has superior characteristics to inhibit deposition of organisms and durability, dispenses with maintenance work, and offers no toxicity problems. A resin layer made up of an electrical insulating material is bonded to the inner wall periphery of a cylindrical pipe member. A metal gauze of a copper alloy is applied onto the surface of the resin layer. The metal gauze is either unfolded and drawn out or rolled over with the inner side turned outwards for its application to the surface of the resin layer. The copper alloy has a Be content of 0.2 to 2.8% by weight, and is selected from, e.g., Be--Cu, Be--Co--Cu, Be--Co--Si--Cu and Be--Ni--Cu alloys.


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Inoue, Shunji. (1994). Lining of organism deposit-inhibiting structure (U.S. Patent No. 5358589). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5358589

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