The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 1994

Filed:

Feb. 02, 1993
Applicant:
Inventors:

Harald Ibach, Aachen, DE;

Dieter Bruchmann, Aldenhoven, DE;

Sieghart Lehwald, Julich, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
250305 ;
Abstract

An electrostatic deflector for energy selection of a beam of charged particles has a plurality of main deflector plates arrayed in a generally cylindrical basic shape and to which electrostatic potentials are applied. The main deflector plates are shaped and the potentials are applied to generate a path of said beam from an input side of said deflector to an output side thereof by virtue of a deflecting field which is increasingly weakened to both sides of a central portion of the beam toward the main deflector plates relative to a field of ideal cylindrical shape, thereby causing second order angular aberration of the beam to substantially vanish. A pair of end deflector plates at opposite ends of the cylindrical basic shape have a repulsive potential with respect to the beam to effect focussing of the beam perpendicular to a dispersion plane of the deflector.


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