The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1994
Filed:
Jan. 15, 1992
Kevin J Orvek, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A silicon semiconductor wafer (64) is processed within a container (62) to form a positive photolithographic image thereon. The wafer is coated with a phenol-containing resin photoresist (76). The photoresist (76) is exposed to deep ultraviolet light (84) through a reticle (82) to form exposed areas (90 and 92). HMDS (94) is then diffused into the resist (76) everywhere except the exposed areas (90 and 92) which are protected by cross-linked phenol molecules. The HMDS (94) forms silicon bonds with the diffused areas (94) which are thus prevented from being etched by an oxygen reactive ion etch. The exposed areas (90 and 92) are not similarly protected and recessed areas (102 and 104) are formed. Subsequent deposition or etching may then be conducted on the substrate (74) in the recessed areas (102 and 104).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile