The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 1994
Filed:
Nov. 09, 1992
Applicant:
Inventors:
Raymond A Zuhr, Oak Ridge, TN (US);
Tony E Haynes, Knoxville, TN (US);
Andrzej Golanski, Cheylas, FR;
Assignee:
Martin Marietta Energy Systems, Inc., Oak Ridge, TN (US);
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427526 ; 427527 ; 427528 ; 427570 ;
Abstract
An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.
Zuhr, Raymond. (1994). Apparatus and method for selective area deposition of thin films on (U.S. Patent No. 5354583). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5354583
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