The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 1994

Filed:

Aug. 09, 1993
Applicant:
Inventors:

Keith M Hutchings, Groombridge, GB;

Andrew L Goodyear, Redhill, GB;

Paul A Gough, Smallfield, GB;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
257361 ; 257328 ; 257363 ; 257335 ;
Abstract

A semiconductor component (1a) has first and second insulated gate field effect devices (T1 and T2) formed within the same seminconductor body (2). The devices (T1 and T2) have a common first main electrode (D) and an arrangement (20) provides a resistive connection (20b) between a second main electrode (S2)of the second device (T2) and the insulated gate (G1) of the first device (T1). The second device (T2) is formed so as to be more susceptible than the first device (T1) to parasitic bipolar transistor action for causing, when the first and second devices (T1 and T2) are turned off and a voltage exceeding a critical voltage (V.sub.c) is applied to the common first main electrode (D), the parasitic bipolar transistor (B) within the second device (T2) to turn on producing a current for causing, by virtue of the resistive connection (20b) between the second main electrode (S2) of the second device (T2) and the insulated gate (G1) of the first device (T1), the voltage at the insulated gage (G1) of the first device (T1) to alter to cause the device (T1) to turn on. This allows the energy of the overvoltage to be dissipated by conduction of the first insulated gate field effect device to avoid any potentially damaging effects, such as irreversible bipolar breakdown or performance degradation due to hot carrier injection into the gate oxide.


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