The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 1994

Filed:

Jun. 02, 1993
Applicant:
Inventors:

Dong R Kim, Daejeon-si, KR;

Chan H Lee, Daejeon-si, KR;

Assignee:

Lucky, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08J / ;
U.S. Cl.
CPC ...
524501 ; 525 71 ;

Find Patent Forward Citations

Kim, Dong. (1994). Process for preparation of impact resistance and high gloss (U.S. Patent No. 5352728). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5352728

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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