The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 1994
Filed:
Aug. 10, 1993
Applicant:
Inventors:
Hisanori Ohara, Itami, JP;
Hiromu Kawai, Itami, JP;
Shigehiko Takaoka, Tokyo, JP;
Yasuhiro Katoh, Tokyo, JP;
Assignees:
Tokyo Tungsten Co., Ltd, Tokyo, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; H01J / ;
U.S. Cl.
CPC ...
427250 ; 4272551 ; 4272552 ; 4272557 ; 427124 ; 427314 ; 427405 ; 378144 ;
Abstract
A method for manufacturing a rotary anode for use in an X-ray tube is proposed. The method has the step of forming, on a graphite substrate plate, an intermediate layer of rhenium by subjecting a metallic chloride to the thermal decomposition CVD process at a substrate temperature of 1200.degree. C. or more. The method further has the step of forming, on the intermediate layer, an X-ray generating layer of tungsten or tungsten-rhenium alloy by subjecting a metallic fluoride to the hydrogen reduction thermal CVD process.