The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 1994

Filed:

Jan. 06, 1993
Applicant:
Inventors:

Chang-jip Yang, Kyungki-do, KR;

Kyu-bok Ryu, Kyungki-do, KR;

Jung-soo An, Kyungki-do, KR;

Jun-geen An, Kyungki-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118715 ; 118725 ; 118733 ; 156345 ;
Abstract

The present invention relates to a tube apparatus for manufacturing a semiconductor device, comprising a one-piece cylindrical tube having a door for loading a semiconductor wafer. One end of the tube is closed and two openings are formed adjacent thereto. The other end is conical and has an opening formed in the apex thereof. A saddle having two openings is mounted on the tube so that the two openings of the saddle correspond to the two openings of the tube which are adjacent to the closed end. Using the tube apparatus enhances the efficiency of a diffusion process. Contaminant residue does not remain in the process tube because the temperature therein is more uniform over the length of the tube, compared to a conventional apparatus. The tube can therefore be used semi-permanently.


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