The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 1994
Filed:
Jan. 26, 1993
Zhuxin J Lu, Glendale, AZ (US);
J Ward MacArthur, Scottsdale, AZ (US);
Brian C Horn, Phoenix, AZ (US);
Honeywell Inc., Minneapolis, MN (US);
Abstract
A process control system which includes at least one manipulated variable and at least one controlled variable, provides a method for robust control of a process. Predetermined constraints of the manipulated variables and the controlled variables, and the present values of the manipulated variables are obtained. New values are calculated for the controlled variables for a predetermined number of points in the future, such that the values of the controlled variables are within the predetermined range thereby obtaining an optimal robustness of the resultant controller. The manipulated variables are also calculated to be within predetermined constraints, and the controlled variables to fall within a predetermined range when controllable. From a plurality of solutions, a most robust solution is selected. Then the manipulated variables are adjusted to cause the process control system to drive the values of the controlled variables to the calculated values.