The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 1994

Filed:

Dec. 06, 1991
Applicant:
Inventor:

Mehmet Rona, Belmont, MA (US);

Assignee:

Fastran, Inc., Boston, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257402 ; 257194 ; 257656 ;
Abstract

This invention relates to a process for fabricating a metal-oxide-semiconductor device and to the semiconductor device which has enhanced charge mobility due to the inclusion of a thin layer of intrinsic semiconductor which provides a 'fast track' charge channel directly at the accumulated inversion layer. The particular semiconductor device described is the enhanced mobility metal-oxide-semiconductor field effect transistor EMMOSFET having the intrinsic layer from about 100 .ANG. to about 1000 .ANG. thick. The intrinsic layer provides a low resistivity channel between the source and drain of the EMMOSFET resulting in an increase in device speed and a decrease in device heat generation.


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