The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 1994
Filed:
Mar. 04, 1993
Tadashi Matsuda, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A conductivity modulation type field effect transistor comprises an n.sup.- type low concentration impurity layer of high resistance formed on an n.sup.+ type silicon substrate, a first channel region of a given width formed on the low concentration impurity layer, a pair of p type gates oppositely formed with the first channel region therebetween, an n.sup.- type low concentration impurity layer formed on the first channel region including the p.sup.+ gate, a p channel layer including two channel regions formed on the n.sup.- type low concentration impurity layer, and a pair of n.sup.+ type sources formed on the second channel region with their center aligned with a center of the first gate means, in which, after the formation of the n.sup.+ type source, a groove is formed at each side of a respective semiconductor device, first gate electrodes are provided on the bottom surface and side wall of the groove with a gate oxide film therebetween whereby the transistor has the blocking capability of achieving a normally OFF state.