The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 1994
Filed:
Mar. 19, 1993
Applicant:
Inventors:
Narito Shibaike, Hirakata, JP;
Michiyoshi Nagashima, Ikoma, JP;
Fumiaki Ueno, Hirakata, JP;
Toshinori Kishi, Osaka, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ;
U.S. Cl.
CPC ...
20419234 ; 156651 ; 1566611 ; 156643 ;
Abstract
A method of producing a microscopic structure by anisotropic etching, in which ion etcing is conducted by irradiating an ion beam emitted by an ion source over a workpiece while a direction of progress of the ion etching is being changed.