The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 1994
Filed:
Jun. 01, 1993
Takashi Kawabe, Hitachi, JP;
Eiji Ashida, Hitachiota, JP;
Moriaki Fuyama, Hitachi, JP;
Tadayuki Iwakura, Hitachi, JP;
Hiroshi Fukui, Hitachi, JP;
Yoshikazu Tsuji, Kanagawa, JP;
Shunichiro Kuwatsuka, Odawara, JP;
Harunobu Saito, Odawara, JP;
Yoshiki Hagiwara, Hadano, JP;
Issei Takemoto, Hiratsuka, JP;
Masayasu Fujisawa, Kanagawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of fabricating a thin-film magnetic in which a mask pattern in etching a bottom pole is formed of first and second mask films in this order when viewed from the bottom pole, the first mask film is used for defining, by self-alignment, the length of that portion of the side edge of a top pole which is nearly perpendicular to a magnetic gap, the second mask film makes it possible to etch the bottom pole with high dimensional accuracy, a non-magnetic film is formed on the mask pattern having the bottom pole thereunder and the exposed region of a substrate, and the top pole is formed after the mask pattern has been exposed and removed.