The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 1994
Filed:
Apr. 02, 1993
Applicant:
Inventors:
Lidia T Calcaterra, Arlington Heights, IL (US);
Mathias P Koljack, Schaumburg, IL (US);
Assignee:
Allied-Signal Inc., Morris Township, Morris County, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B32B / ; B32B / ; B32B / ; C08L / ; C08F / ;
U.S. Cl.
CPC ...
428 96 ; 4273934 ; 4284758 ; 525207 ; 525221 ; 526271 ; 5263182 ;
Abstract
A method of imparting acid dye stain resistance to polyamide substrates having improved durability of the stain resistance to detergent washings comprising treating the polyamide substrate with an effective amount of a mixture of phenyl vinyl ether/maleic diacid copolymer and 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether/maleic diacid copolymer, wherein the phenyl vinyl ether/maleic diacid copolymer is the stain resist agent, and the 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether/maleic diacid copolymer is added to improve the durability of the stain resist agent.