The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 1994
Filed:
Aug. 20, 1992
Wolfgang Hemmerling, Sulzbach, DE;
Hans-Rolf Dubal, Konigstein/Taunus, DE;
Claus Escher, Muhltal, DE;
Gerhard Illian, Frankfurt am Main, DE;
Yoshio Inoguchi, Tokyo, JP;
Ingrid Muller, Hofheim am Taunus, DE;
Mikio Murakami, Konigstein/Taunus, DE;
Dieter Ohlendorf, Liederbach, DE;
Rainer Wingen, Hattersheim am Main, DE;
Hoechst Aktiengesellschaft, Frankfurt am Main, DE;
Abstract
The novel silylalkyl or silylalkenyl compounds correspond to the general formula (I) ##STR1## Here the symbols A.sup.1, A.sup.2, A.sup.3 denote aromatic or heteroaromatic molecular units such as 1,4-phenylene or pyrimidine-2,5-diyl which are combined via a single bond (for k, m=0) or via functional groups M.sup.1,M.sup.2 such as CO--O or CH.sub.2 --O; j, k, l, m, n are zero or 1 (j+l+n=2 or 3). The radicals R.sup.2, R.sup.3, R.sup.4, R.sup.5 are hydrogen or alkyl/alkenyl, cycloalkyl, and the radicals R.sup.6, R.sup.7, R.sup.8 have a comparable meaning (hydrogen); R.sup.1 is alkyl/alkenyl or one of the substituents known from LC chemistry such as an .alpha.-haloalkanoic radical. In some cases compounds have wide and polymorphous liquid crystalline phases.