The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 1994

Filed:

Sep. 11, 1992
Applicant:
Inventors:

Jemm Y Liang, San Jose, CA (US);

Shichao Ge, Santa Clara, CA (US);

Assignee:

Panocorp Display Systems, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G09G / ; H01J / ; H01J / ;
U.S. Cl.
CPC ...
315366 ; 313422 ; 313309 ; 313336 ;
Abstract

This invention is about new cathode structures involving the FEAs (field emitter arrays) and the application of these new cathode structures in EFD (Electron Fluorescent Display), EFLCD (Electron Fluorescent Liquid Crystal Display) and MFD (Microtip Fluorescent Display) type direct matrix addressed type display. One aspect of this invention is related to eliminating the difficulty large area FEA cathode manufacturing by combining the control apparatus of EFD and EFLCD with the efficient electron emission process of the FEA. The second aspect of this invention is related to the employment of local embedded circuit components to help enhancing the uniformity of the electron emitting process of FEA. The preferred embodiments of the invented cathode structure in EFD or EFLCD employ multiple pieces of field emitter arrays sparsely disposed inside a vacuum chamber to generate the electron clouds which is then accelerated and controlled by other control means of EFD or EFLCD structures. The preferred embodiments of the invented cathode structure in MFD variety devices provides the benefit of improved the uniformity, lower the control voltage range and increased duty factor independent by employing various local control circuit configuration in the FEA cathodes.


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