The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 1994
Filed:
Apr. 01, 1993
Derek G Aqui, San Jose, CA (US);
Peter G Borden, San Mateo, CA (US);
High Yield Technology, Sunnyvale, CA (US);
Abstract
A structure and a method use a non-invasive particle monitor to detect particles in a process chamber for a 'down sputtering' metal deposition process. In one embodiment, only non-spherical particles are detected using a single laser beam of a predetermined polarization is used, and the phase shift in the polarization due to the passing of a particle through the laser beam is measured. In another embodiment, two closely spaced orthogonally polarized laser beams are used, and the differential intensity of the laser beams is measured when a particle passes through one of the laser beams. In another embodiment, shield tubes for housing optical components are used to prevent coating of the optical components and to prevent deposition to take place outside the shielded area. Internal electric and magnetic fields are used to drive particles through the laser beams for particle detection.