The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 1994

Filed:

Mar. 19, 1993
Applicant:
Inventors:

Shigeaki Namba, Hitachi, JP;

Tatsuo Sakamoto, Hitachi, JP;

Toshiki Kahara, Ibaraki, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M / ;
U.S. Cl.
CPC ...
429 12 ;
Abstract

There is disclosed a chemical reaction installation in which a number of chemical reaction vessels are arranged efficiently so as to decrease an installation area while keeping a good maintainability. A processing system is provided at the inside, and a multi-story construction is provided, and access for maintenance purposes can be obtained from the side of each floor of the multi-story construction.


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