Single-source molecular organic chemical vapor deposition agents and use

Abstract

Neutral single-source molecular organic precursors containing tetradentate tripodal chelating ligands are provided that are useful for the preparation of films using chemical vapor deposition. These complexes can be generally represented by the formula ##STR1## wherein 'M' is selected from the group consisting of a lanthanide, an actinide, a Group IIIA metal, a Group IIIA metalloid, a Group IVA metal, a Group IVA metalloid, a Group VA metal, a Group VA metalloid, a Group IIIB metal, a Group IVB metal, a Group VB metal, a Group VIB metal, a Group VIIB metal, and a Group VIIIB metal. The ligand 'Z' can be present or absent, i.e., k=0-1, and is selected from the group consisting of hydrogen, halide, and a group bonded to 'M' through N, O, P, S, As, Si, or C. In the tetradentate tripodal chelating ligand 'E.sub.c ' is N, P, or As, and m=0-1. When 'E.sub.t ' is N, P, or As, m=1, and when 'E.sub.t ' is O, S, or Se, m=0. Each 'R.sup.1 ' is independently selected from the group consisting of hydrogen, (C.sub.1 -C.sub.20)alkyl, (C.sub.2 -C.sub.20)alkenyl, (C.sub.2 -C.sub.20)alkynyl, (C.sub.6 -C.sub.18)aryl, (C.sub.7 -C.sub.20)aralkyl, a (C.sub.5 -C.sub.18)heterocycle, and triorganosilyl. In --[C(R.sup.2).sub.2 ].sub.n --, n=1-4, and each 'R.sup.2 ' is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, aryl, aralkyl, and a heterocycle.