The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 1994
Filed:
Apr. 06, 1992
Applicant:
Inventors:
Georgy Z Paskalov, St. Petersburg, SU;
Svetlana A Krapivina, St. Petersburg, SU;
Alexander K Filippov, St. Petersburg, SU;
Assignee:
Plasma Plus, Los Angeles, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D06M / ; D06M / ; D06M / ;
U.S. Cl.
CPC ...
811552 ; 427569 ; 427575 ; 4272551 ; 4272552 ; 4272553 ;
Abstract
Efficiency of low pressure gas plasma processes is increased by addition of small quantities of water vapor to the primary gas constituting the plasma. Treated fabrics and polymer films show decreased wetting angle and increased capillary absorption, which beneficially affects the material's susceptibility to dyeing and impregnation.