The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1994
Filed:
Oct. 19, 1990
Applicant:
Inventors:
Steven R Brueck, Albuquerque, NM (US);
Saleem H Zaidi, Albuquerque, NM (US);
Assignee:
University of New Mexico, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356363 ; 356356 ; 356401 ;
Abstract
In the manufacture of microelectronic and optoelectronic circuitry, an arrangement for aligning submicrometer lithographic features on a wafer illuminating a diffraction grating on the wafer with an interferometrically established radiation intensity pattern having a predetermined relationship to the lithographic features in another level of the wafer that is to be exposed, the radiation diffracted from the illuminated grating forming moire interference pattern providing spatial amplification of the grating period for alignment purposes by the ratio of the moire fringe spacing to the grating period.