The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1994
Filed:
Jun. 04, 1992
Applicant:
Inventor:
Rikio Ikeda, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430325 ; 430396 ; 430329 ; 430330 ; 430397 ; 156646 ;
Abstract
Disclosed is herein a method of developing an exposed resist film formed over a major surface of a substrate, the method comprising: holding the substrate carrying the resist film in contact with the supporting surface of a supporting member, having an area smaller than the surface area of the substrate, and supplying a developer onto the resist film so that the developer is retained in a developer puddle by surface tension on the surface of the resist film to develop the resist film, wherein the substrate carrying the resist film is separated from the supporting member during the progress of the development of the resist film.