The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 1994

Filed:

Jul. 02, 1990
Applicant:
Inventors:

Timothy R Heindel, Neenah, WI (US);

Michael J Garvey, Cordova, TN (US);

Daniel W Dick, Paris, TX (US);

Richard F Keller, Hortonville, WI (US);

Mary P Jordan, Neenah, WI (US);

Alan F Schleinz, Appleton, WI (US);

Assignee:

Kimberly-Clark Corporation, Neenah, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427-231 ; 4272071 ; 427280 ; 427288 ; 427378 ; 427421 ; 427-8 ; 604366 ;
Abstract

A distinctive method and apparatus for depositing a pattern of material, such as hot-melt adhesive, onto a substrate comprises a supplying mechanism for forming a first and at least a second substantially continuous stream of the selected material, and a gas-directing mechanism for forming a plurality of gas streams. The gas streams have selected velocities and are arranged to entrain the material streams to impart a swirling motion to each of the material streams as it moves toward the substrate. A transport mechanism moves the substrate relative to the supply mechanism along a selected machine direction. A regulating mechanism controls the supplying mechanism and gas-directing mechanism to direct the material stream in a selected path toward the substrate and deposit the material in adjacent semi-cycloidal patterns on the substrate while closely controlling a selected cross-directional positioning of one or more of the deposited patterns.


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