The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1994
Filed:
Jan. 21, 1993
John L Cain, Schertz, TX (US);
VLSI Technology, Inc., San Jose, CA (US);
Abstract
Disclosed are methods for reducing the degree of underetching and particulate contamination occurring during dry non-isotropic etching of a polycide layer on the surface of a silicon wafer maintained in a wafer holder wherein the backside of the holder is cooled with a stream of helium gas. Specifically, in the disclosed methods, dry non-isotropic etching of the polycide layer is conducted either in the absence of backside cooling or the helium gas flow utilized in backside cooling is maintained at a pressure of no more than 3 torr.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile