The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 1994
Filed:
Jun. 29, 1993
Ralph M Grant, Rochester, MI (US);
Forrest Wright, Rochester, MI (US);
Grant Engineering, Inc., Rochester, MI (US);
Abstract
Method and apparatus for analyzing the deformation of an object resulting from the application of stress. A novel optical element is used to perform shearometric analysis upon a test object. The novel optical element has an overall pattern of first and second pluralities of regions having significantly different indices of transmissivity. The pattern of variations causes pairs of light rays which are reflected from two distinct points on the test object at a divergent angle to emerge from the optical element so that they are nearly parallel. The nearly parallel rays are then received upon a photoelectrical sensing means such as a video camera or photoelectric array. Because the rays impinging thereon are nearly parallel, they may be adequately resolved by the photoelectric sensing means, thus enabling shearometric analysis to be performed electronically in a rapid and cost-effective manner.