The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 1994
Filed:
Apr. 27, 1993
Jeffrey L Helfer, Webster, NY (US);
Mark J Devaney, Jr, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A processor for processing photosensitive material having a first processing tank containing a first processing fluid containing at least one component of a first concentration and a second processing tank containing processing fluid having the same component to that of the first processing fluid, however, the concentration of the component being different than the first concentration. A weir is provided for causing fluid to flow from the first tank to the second tank resulting from the hydrostatic pressure of the first fluid in the first tank. The weir has a configuration such that concentration difference between processing fluid in said tanks does not change significantly over a predetermined period of time.