The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 1994
Filed:
Jul. 28, 1993
Christian Schaefer, Hanau am Main, DE;
Klaus Hartig, Ronneburg, DE;
Leybold Aktiengesellschaft, Hanau, DE;
Abstract
Method and apparatus for the coating of substrates (1, 1', . . . ), preferably by cathode sputtering in a vacuum apparatus consisting of at least one sputtering chamber (6) in which different coating systems can be applied to the preferably curved substrates to be coated (1, 1', . . . ), the substrates (1, 1', . . . ) can be moved in a direction B through the vacuum apparatus and pass through the sputtering chamber (6) repeatedly in direction B as well as in the opposite direction in the so-called multipass mode, the uncoated substrates (1, 1', . . . ) or substrate carriers (12, 11', . . . ) being combined before entering the sputtering chamber into groups of several, preferably two substrates (1, 1', . . . ) each, and these run simultaneously through the sputtering chamber (6) in the so-called dual multipass mode.