The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 1994
Filed:
Feb. 05, 1993
Applicant:
Inventors:
Richard Mlcak, Somerville, MA (US);
Harry L Tuller, Wellesley, MA (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F / ; C25F / ;
U.S. Cl.
CPC ...
2041293 ; 20412965 ; 2041297 ; 20412975 ;
Abstract
A method of photo-assisted electrochemical machining of micromechanical structures from a silicon substrate having both p and n regions in a hydrofluoric electrolyte solution is disclosed. Both p and n regions of the silicon substrate may be selectively etched, with differing regions as etch stops, at controlled rates by the appropriate choice of cell bias, p-n junction bias and illumination intensity.