The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 1994
Filed:
Feb. 25, 1993
Applicant:
Inventor:
John H Jerman, Palo Alto, CA (US);
Assignee:
IC Sensors, Inc., Milpitas, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
156647 ; 156643 ; 156651 ; 156644 ; 156657 ; 1566611 ; 156662 ;
Abstract
A process for forming a three-dimensional structure etched in a substrate with perfect convex corners includes partitioning the structure into two features such that the exterior corners are formed by the intersection of the two features; etching the first feature; forming an etch mask on the surface and on the substrate of the etched first feature; opening a window in the etch mask on the substrate to define the second feature; and etching the second feature, thereby obtaining the desired structure.
Jerman, John. (1994). Micromachining process for making perfect exterior corner in an etchable (U.S. Patent No. 5338400). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5338400
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile