The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1994
Filed:
Oct. 01, 1991
Quoc T Lac, Hopewell Junction, NY (US);
Edward C Lowry, Beacon, NY (US);
Robert B Madden, Poughquag, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A two-step procedure for pattern assignment. The initial assignment is based on a heuristic criteria that like lines should be separated from one another to the greatest degree possible, but with a constraint that two 'like' conductors should not be located in adjacent locations in the pattern if at all possible. The initial assignment pattern is then optimized by an iterative procedure to reduce Delta-I noise to a minimum. Assignments in a small sub-matrix (for example a 3x3-matrix) of the entire pattern are iteratively changed and the Delta-I noise for each iterative is determined to establish a pattern for the sub-matrix with the minimum Delta-I noise. Adjacent sub-matrices are examined in the same manner with this important criteria. Each sub-matrix after the first, overlaps at least one row or column of a previous optimized sub-matrix, and the pin assignments in the overlap portion remain frozen when optimizing the adjacent sub-matrix.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile