The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1994
Filed:
Feb. 23, 1993
Nobuo Hori, Tokyo, JP;
Yoshinobu Takano, Tokyo, JP;
Takashi Takahashi, Tokyo, JP;
Shigenori Nagano, Tokyo, JP;
Reiji Hashimoto, Tokyo, JP;
Kabushiki Kaisha Topcon, Tokyo, JP;
Abstract
A method of patterning an optical device for an optical IC whose purpose is to diffract a light beam incident on one surface of a device substrate to cause a light beam to emerge from another surface of the device. In this method, a layer of a substance of variable refractive index is formed on an optical substrate, coherent light is caused to irradiate the layer from the direction of the normal to the surface which will be the incidence side of the device when it is used or from the opposite side, and coherent light is caused to irradiate the layer from the direction of the normal to the surface which will be the emergence side of the device when it is used or from the opposite side to form an interference pattern on the layer that performs diffraction.