The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1994
Filed:
Mar. 25, 1993
Nguyet H Phan, Los Angeles, CA (US);
Vilambi N Reddy, Lakewood, CA (US);
Frank A Ludwig, Rancho Palos Verdes, CA (US);
Bruce M Eliash, Los Angeles, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
A method of monitoring major constituents within a plating bath. The method involves applying an electrical signal to a working electrode positioned within the plating bath solution, varying signal parameters, and measuring the resultant response signal. The characteristics of the response signal indicate major constituent concentration levels. The method complements and is easily integrated with known voltammetric techniques for analysis of trace constituents, thus forming an integral part of an efficient overall plating bath analysis system. By adjusting major constituent concentration levels in accordance with measurements made using the method of the present invention, a high quality plating bath can be easily and inexpensively maintained.