The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1994
Filed:
Sep. 09, 1992
Applicant:
Inventors:
Eiji Nishimura, Saitama, JP;
Masami Kuroki, Saitama, JP;
Naoyuki Kikutake, Tokyo, JP;
Yuuichiro Shindou, Saitama, JP;
Assignee:
Japan Energy Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C25C / ;
U.S. Cl.
CPC ...
204 / ; 2042 / ; 75612 ; 75621 ; 419 61 ;
Abstract
A sputtering target for forming a thin film consisting of high-purity titanium, in which the content of alkali metal is 0.1 ppm or less, the content of radio active elements is 1 ppb or less, and the oxygen content is 100 ppm or less, and, further, the balance of the elements is Ti, is produced by a fused salt electrolysis, in which the members of the electrolytic cell being in contact with the fused salt consist of Ni.
Nishimura, Eiji. (1994). Method and apparatus for producing a high-purity titanium (U.S. Patent No. 5336378). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5336378
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile