The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1994
Filed:
May. 27, 1993
Hiroyuki Kado, Katano, JP;
Takao Tohda, Ikoma, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A method of making a cantilever stylus for an atomic force microscope comprises forming a film on a surface of a substrate, the film comprising a stylus material that is different from the material of the substrate. A resist thin film of a material different from the stylus material is formed on the surface of the stylus material so as to have a tip. The stylus material is then etched with an isotropic etching technique to a depth of etching greater than the radius of curvature of the tip of the resist film so that the stylus material, having two opposite principal surfaces, has a tip formed on one of the principal surfaces with a radius of curvature less than 0.1 .mu.m which protrudes beyond a tip of the other principal surface. At least the resist thin film and the substrate at the tips of the principal surfaces of the stylus material are then removed.