The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1994
Filed:
Mar. 16, 1992
Tomoko Maruyama, Isehara, JP;
Takashi Iizuka, Atsugi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An X-ray mask support has an X-ray permeable film and a support frame supporting the film and the X-ray permeable film mainly includes a single-layer film having different densities in its thickness direction or a multi-layer laminate film of layers having different densities, but being constituted of compounds having the same main component. The X-ray mask support can be used as an X-ray mask structure for X-ray lithography by providing an X-ray absorber on the X-ray permeable film. The X-ray permeable film exhibits a high permeability for X-rays and visible/near infrared rays and does not bend even by X-ray irradiation, thereby achieving X-ray exposure of high precision and high resolution.