The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1994
Filed:
Oct. 02, 1992
Bruce R Muller, Rochester, NY (US);
Douglas O Hall, Canandaigua, NY (US);
David G Sherburne, Ontario, NY (US);
Thomas W Glanville, Churchville, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
An improvement in an apparatus for processing photosensitive materials. The apparatus includes a processing chamber through which the material can be advanced for processing the material. The processing chamber has an entrance at one end and an exit at the other end to allow the photosensitive material to travel through the chamber. The apparatus further includes a tank for holding a processing fluid. At least one nozzle assembly is provided for supplying processing fluid from the tank to the processing chamber. The nozzle assembly comprises an outer nozzle secured to the tank and an inner nozzle secured to the upper tank. The inner and outer nozzles are spaced apart a predetermined distance so as to form a discharge opening therebetween which is in fluid communication with the processing fluid in the tank so as to create a first fluid layer on one side of the photosensitive material passing through the processing chamber. The inner and outer nozzles have a configuration designed to maintain the predetermined distance between the inner and outer nozzles substantially constant along the length of the discharge opening.