The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 1994

Filed:

Jul. 01, 1992
Applicant:
Inventors:

Mitsuhiro Nakano, Kasugai, JP;

Junichi Kai, Kawasaki, JP;

Assignees:

Fujitsu Limited, Kawasaki, JP;

Fujitsu VLSI Limited, Kasugai, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504922 ; 2504911 ; 250400 ;
Abstract

A charged particle beam exposure apparatus is provided with a source for irradiating a charged particle beam on an object which has a position detection mark provided thereon and is carried on a movable stage, a deflection part for deflecting the charged particle beam based on deflection signals, a first detection part for detecting the position detection mark of the object, a second detection part for detecting a stage position of the object and for outputting a position detection signal, a moving part for moving the stage which carries the object, and a control unit for controlling inputs and outputs of the source, the deflection part, the first and second detection parts and the moving part. The control unit corrects the deflection signals which are supplied to the deflection part so that the position detection mark is irradiated by the charged particle beam based on the position detection signal which is output from the second detection part and is related to the stage position of the object which is continuously moved by the moving part.


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