The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1994
Filed:
Apr. 13, 1993
Applicant:
Inventors:
Tetsumasa Ito, Tokyo, JP;
Yoshitomo Nakagawa, Tokyo, JP;
Assignee:
Seiko Instruments Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ; H01J / ;
U.S. Cl.
CPC ...
250288 ; 31511181 ;
Abstract
A structure for enabling control of the plasma potential of an ICP-MS. The structure includes: a shield plate 10 made of metal inserted between a plasma torch 1 and a high-frequency coil 2, a variable capacitor 11 connected between the shield plate 10 and ground, and an insulation member 15 is arranged to prevent contact of the high-frequency coil 2 with the shield plate 10. Even if a sample is introduced into ICP by any known method, it becomes capable to perform ICP-MS analysis while optimizing the response to interfering ions and detection sensitivity.