The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 1994
Filed:
Feb. 17, 1993
Akiyoshi Mikami, Yamatotakada, JP;
Takashi Ogura, Nara, JP;
Kousuke Terada, Tenri, JP;
Masaru Yoshida, Nara, JP;
Takuo Yamashita, Tenri, JP;
Koichi Tanaka, Nara, JP;
Katsushi Okibayashi, Sakurai, JP;
Shigeo Nakajima, Nara, JP;
Hiroaki Nakaya, Tenri, JP;
Kouji Taniguchi, Nara, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A vapor deposition apparatus for depositing thin film on substrates in which solid starting materials are used. In this apparatus, a carrier gas flows up and down in the same direction as gas convection, such that the effect of gas convection is minimized and film thickness and impurity concentration are uniform over the substrate surface. This uniformity is achieved by orienting a main reaction tube in a vertical direction, attaching two branch reaction tubes at the top of the main reaction tube, and venting carrier gas out the bottom of the main reaction tube. Alternately, the main reaction tube can be oriented horizontally, with the substrates being carried on a holder within a container having pores on its top and bottom.