The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 1994

Filed:

Nov. 30, 1992
Applicant:
Inventors:

Edwin L Cutright, Powhatan, VA (US);

G Robert Scott, Midlothian, VA (US);

Howard W Vogt, Jr, Providence Forge, VA (US);

Assignee:

Philip Morris Incorporated, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D21H / ; D21H / ;
U.S. Cl.
CPC ...
162139 ; 162186 ; 162109 ; 162135 ; 118211 ; 118262 ; 118264 ; 427210 ; 427286 ; 427428 ;
Abstract

This invention relates to the treatment of substrates with fluidized material in repetitive patterns during application cycles. The treatment patterns made with this invention can be altered by changing machine operating parameters. The patterns of fluidized material are applied to substrates using an applicator drum. Machined in the outer surface of the applicator drum are a plurality of slots filled with deformable material. The deformable material extends to a position in each slot just short of the outside diameter of the applicator drum, leaving a cavity in each slot. These cavities are filled with slurry in a slurry applicator unit. A compression drum mounted within the hollow interior of the applicator drum uses compression tips to displace the deformable material in each slot in succession beyond the periphery of applicator drum at a position adjacent to the substrate, causing the slurry in the cavity to be applied to the substrate.


Find Patent Forward Citations

Loading…