The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 1994
Filed:
Aug. 28, 1992
Shinkichi Horigome, Tachikawa, JP;
Yoshinori Miyamura, Tokyo, JP;
Yumiko Anzai, Tachikawa, JP;
Keizo Kato, Hachioji, JP;
Hiroshi Shiraishi, Hachioji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
In a process for producing optical disks comprising the steps of subjecting the photoresist layer on a substrate formed of silicon, quartz, glass or a metal to light exposure, developing and etching treatments to obtain a stamper and then duplicating an information pattern for an optical disk from the stamper obtained above to a transparent substrate by using a UV curable resin to prepare a replicated substrate of an optical disk, a large number of stampers can be prepared in a short time by conducting the light exposure either by contacting the mask side surface of a substrate provided with a photomask having an information pattern for an optical disk to the photoresist side surface of said substrate having the photoresist layer or by noncontact projection, and a rapid replication of large quantities of replicated substrates becomes possible by using a large number of stampers thus prepared.