The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Mar. 17, 1993
Nippon Steel Corporation, Tokyo, JP;
Abstract
Disclosed are a projection exposure method which comprises the steps of projecting patterns of first and second photo mask elements by a light including a coherent component, each photo mask element having a pattern of a single-layer structure of one of the phase shift film and the light shielding film on a substrate disposed at a predetermined position such that an optically synthesized pattern of the two patterns is formed on the substrate, and controlling a phase of at least one of a first light portion which projects the pattern of the first photo mask element on the substrate and a second light portion which projects the pattern of the second photo mask element on the substrate, such that said first and second light portions have a predetermined phase difference therebetween and a projection exposure apparatus for carrying out the abovementioned method.