The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Apr. 23, 1993
Serge Luryi, Bridgewater, NJ (US);
AT&T Bell Laboratories, Murray Hill, NJ (US);
Abstract
The disclosed novel heterojunction bipolar transistor, to be referred to as the enhanced diffusion transistor (EDT), comprises a base of composition selected such that the base bandgap narrows from emitter towards collector in substantially step-wise fashion, resulting in N (N.gtoreq.2) substantially flat levels in the base bandgap. The height .DELTA..sub.j of the steps in the bandgap is greater than kT (typically at least about 30 meV), and also greater than the threshold energy of an appropriate rapid inelastic minority carrier scattering mechanism (e.g., optical phonon scattering, plasmon scattering) in the base material. The presence of the 'steps' in the base bandgap of the EDT can, in consequence of the resulting strongly accelerated diffusive minority carrier transport in the base, lead to, e.g., improved high frequency characteristics, as compared to otherwise identical prior art (N=1) transistors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile