The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1994
Filed:
Apr. 01, 1993
Applicant:
Inventor:
John D Swift, Hindhead Surrey, GB;
Assignee:
UOP, Des Plaines, IL (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ; C07C / ; C07C / ;
U.S. Cl.
CPC ...
585805 ; 585815 ; 585831 ; 585479 ;
Abstract
The eutectic limit of para-xylene crystallization is overcome by enriching the concentration of para-xylene of the crystallization feed. This is accomplished by passing the crystallization feed stream through a selective adsorption zone to produce a para-xylene-enriched stream and a para-xylene-depleted stream. The para-xylene-depleted stream is passed to an isomerization zone to re-equilibrate the xylene mixture, thereby producing additional para-xylene. The para-xylene-enriched stream is passed to a crystallization zone to produce high purity para-xylene. The result is an increase in the overall para-xylene recovery.